ARRAY SUBSTRATE AND MANUFACTURING METHOD FOR ARRAY

专利名称：ARRAY SUBSTRATE AND MANUFACTURING

METHOD FOR ARRAY SUBSTRATE

发明人：Xiangyang XU申请号：US15101880申请日：20160513

公开号：US20180046050A1公开日：20180215

专利附图：

摘要：An array substrate and a manufacturing method for the same. The arraysubstrate includes a substrate, and multiple gate lines, data lines and common electrodelines. The gate lines are disposed on a first surface, and are insulated from the multiple

gate lines by a first insulation layer. Among two adjacent gate lines and data lines, onepixel region is defined. The array substrate further includes a thin-film transistor, acommon electrode and a pixel electrode. The thin-film transistor includes a gateelectrode, a first insulation layer, a channel layer, a source electrode and a drainelectrode. The multiple common electrode and gate lines are parallel and aretransparent conductive layers. The channel layer, the source electrode, the drainelectrode and the pixel electrode are disposed on the first insulation layer. The pixelelectrode corresponds to the common electrode and electrically connected to the drainelectrode.

申请人：Shenzhen China Star Optoelectronics Technology Co., Ltd.

地址：Shenzhen, Guangdong CN

国籍：CN

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