Method For Manufacturing Array Substrate And Array

专利名称：Method For Manufacturing Array Substrate

And Array Substrate

发明人：Xing MING申请号：US147656申请日：20150906

公开号：US20180157106A1公开日：20180607

专利附图：

摘要：A method for manufacturing an array substrate and an array substrate aredisclosed. The method comprises the steps of forming a plurality of control electrodeson a baseplate, and forming a color-resist region between two adjacent control

electrodes, wherein the color-resist region is a first color-resist region, a second color-resist region, a third color-resist region, and a fourth color-resist region in sequence;forming a first color-resist in the first color-resist region, forming a second color-resist inthe second color-resist region, and forming a third color-resist in the third color-resistregion; and coating the baseplate on which the control electrodes, the first color-resist,the second color-resist, and the third color-resist are formed and the fourth color-resistregion with a transparent photoresist so as to form a flat layer. In the method accordingto the present disclosure, the production efficiency of the array substrate can beimproved.

申请人：Shenzhen China Star Optoelectronics Technology Co. Ltd.,Wuhan China StarOptoelectronics Technology Co. Ltd.

地址：Shenzhen CN,Wuhan CN

国籍：CN,CN

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