Inductor and method for manufacturing the same

专利名称：Inductor and method for manufacturing the

same

发明人：Ji Houn Jung申请号：US113912申请日：20070817公开号：US077575B2公开日：20100713

专利附图：

摘要：A method for manufacturing an inductor according to the embodimentcomprises the steps of: forming a first photoresist pattern; forming an impurity regionforming the inductor by implanting an impurity ion to the substrate by means of the first

photoresist pattern and a pad region applying current across the impurity region;forming a second photoresist pattern so that a position spaced by a predeterminedinterval from the impurity region is opened; and forming a guard impurity region in theposition spaced from the impurity region by implanting the same impurity ion as theimpurity ion by means of the second photoresist pattern.

申请人：Ji Houn Jung

地址：Seoul KR

国籍：KR

代理机构：The Law Offices of Andrew D. Fortney

代理人：Andrew D. Fortney

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